極端紫外線（EUV）リソグラフィ市場規模、シェア、動向、2032年までの世界予測

世界の極端紫外線（EUV）リソグラフィ市場は、2026年の158億4,000万米ドルから2032年には303億6,000万米ドルに、年平均成長率（CAGR）11.4%で成長すると予測されています。スマートフォン、ウェアラブル端末、タブレット端末、ゲーム機などの民生用電子機器の急速な進歩により、高性能、小型設計、エネルギー効率に優れた先進的な半導体チップへの需要が持続的に高まっています。メーカーは、処理速度の向上、グラフィックスの強化、バッテリー駆動時間の延長に対応するため、トランジスタの小型化と高密度化を実現するEUVリソグラフィへの依存度を高めています。折りたたみ式ディスプレイ、拡張現実（AR）、仮想現実（VR）などの次世代技術への移行により、チップの複雑さがさらに増し、高精度なEUVベースの製造ニーズが高まっています。民生用電子機器や自律アプリケーション全体で性能と小型化の要件が高まり続ける中、EUVリソグラフィは、先端ノードで信頼性の高い高性能集積回路を製造するための重要な技術となりつつあります。

調査範囲

本レポートは、極端紫外線（EUV）リソグラフィ市場をセグメント化し、その構成部品、システムタイプ、エンドユーザー、アプリケーション、および地域を予測しています。また、市場における推進要因、制約要因、機会、課題についても考察しています。さらに、南北アメリカ、アジア太平洋、EMEAの3つの主要地域における市場の詳細な分析を提供しています。さらに、主要企業のバリューチェーン分析と、EUVリソグラフィ・エコシステムにおける競合分析も含まれています。

本レポートを購入する主なメリット

• 極端紫外線（EUV）リソグラフィ市場の成長に影響を与える主要な推進要因（最先端ファウンドリノードにおけるEUVリソグラフィの導入急増）、制約要因（高額な先行投資）、機会（先進EUVリソグラフィおよび半導体デバイスへの投資増加）、課題（代替リソグラフィ技術との競争）の分析
• 製品／ソリューション／サービス開発／イノベーション：極端紫外線（EUV）リソグラフィ市場における今後のコンポーネント、技術、研究開発活動に関する詳細な洞察
• 市場開発：収益性の高い市場に関する包括的な情報。本レポートでは、様々な地域における極端紫外線（EUV）リソグラフィ市場を分析しています。
• 市場の多様化：未開拓地域における新しいEUVリソグラフィ、最近の動向、そして極端紫外線（EUV）リソグラフィ市場への投資に関する包括的な情報を提供しています。
• 競合評価：KLA Corporation（米国）、ZEISS Group（ドイツ）、TRUMPF（ドイツ）、AGC Inc.（日本）、Lasertec Corporation（日本）など、EUVリソグラフィ関連部品を提供する主要企業の市場シェア、成長戦略、製品・サービスに関する詳細な評価を提供しています。

Report Description

The global extreme ultraviolet (EUV) lithography market is expected to grow from USD 15.84 billion in 2026 to USD 30.36 billion by 2032, at a CAGR of 11.4%. The rapid advancements in consumer electronics, including smartphones, wearables, tablets, and gaming devices, are driving sustained demand for advanced semiconductor chips that offer higher performance, compact designs, and improved energy efficiency. To support faster processing, enhanced graphics, and longer battery life, manufacturers increasingly rely on EUV lithography to enable smaller transistors and higher transistor density. The shift toward next-generation technologies, including foldable displays, augmented reality, and virtual reality, is further increasing chip complexity and reinforcing the need for high-precision EUV-based manufacturing. As performance and miniaturization requirements continue to rise across consumer electronics and autonomous applications, EUV lithography is becoming a critical enabler for producing reliable, high-performance integrated circuits at advanced nodes.

“Light sources to exhibit highest CAGR from 2026 to 2032.”

Light sources are expected to witness the highest CAGR in the extreme ultraviolet (EUV) lithography market due to their direct impact on system productivity, throughput, and cost efficiency at advanced semiconductor nodes. Continuous demand for higher wafer throughput is driving the need for increased EUV source power, improved stability, and longer uptime, prompting frequent upgrades and replacements of existing light source modules. In addition, the transition toward more advanced process nodes and the gradual shift to next-generation EUV platforms are increasing performance requirements for light sources, accelerating R&D investments and adoption. The high technical complexity, limited supplier base, and strong focus on productivity-driven enhancements further support faster revenue growth for this component compared to other EUV system elements.

“Logic chips held largest share of extreme ultraviolet (EUV) lithography market in 2025.”

Logic chips held the largest market share in the application segment of the extreme ultraviolet (EUV) lithography market in 2025, driven by early and widespread adoption of EUV at advanced process nodes. Leading-edge logic devices at 7 nm, 5 nm, and 3 nm require extremely fine patterning, tight overlay control, and high transistor density, all of which are more efficiently achieved using EUV compared with multi-patterning DUV techniques. The rapid growth of applications such as artificial intelligence, high-performance computing, data centers, and advanced automotive electronics is driving strong demand for high-performance logic chips, accelerating EUV tool utilization and capacity expansion. In contrast, memory manufacturers have adopted EUV more selectively, focusing on specific layers, which further reinforces the dominance of logic chips in overall extreme ultraviolet (EUV) lithography demand.

“Asia Pacific to be fastest-growing regional market for EUV lithography from 2026 to 2032.”

Asia Pacific is expected to register the highest CAGR during the forecast period, driven by its strong concentration of leading semiconductor foundries and integrated device manufacturers (IDMs), as well as continuous investments in advanced-node manufacturing. The region’s dominance is supported by large-scale capacity expansions at 5 nm, 3 nm, and sub-3 nm nodes, rising demand for logic chips used in AI, high-performance computing, and advanced consumer electronics, and a mature semiconductor supply chain that enables rapid EUV adoption. In addition, sustained capital expenditure, aggressive technology roadmaps, and government-backed initiatives to strengthen domestic semiconductor capabilities are accelerating EUV tool installations. These factors collectively position Asia Pacific as the primary demand center and growth engine for the global extreme ultraviolet (EUV) lithography market.

Breakdown of Primaries

Various executives from key organizations operating in the extreme ultraviolet (EUV) lithography market were interviewed in-depth, including CEOs, marketing directors, and innovation and technology directors.

• By Company Type: Tier 1–30%, Tier 2–50%, and Tier 3–20%
• By Designation: C-level Executives–25%, Directors–35%, and Others–40%
• By Region: Asia Pacific–40%, Americas–25%, and EMEA- 35%

The extreme ultraviolet (EUV) lithography market is dominated by ASML (Netherlands) as the sole manufacturer of EUV lithography products, as well as by component manufacturers such as TRUMPF (Germany), Ushio Inc. (Japan), Energetiq (US), Zeiss Group (Germany), NTT Advanced Technology Corporation (Japan), Rigaku Holdings Corporation (Japan), Edmund Optics Inc. (US), AGC Inc. (Japan), Tekscend Photomask (Japan), Lasertec Corporation (Japan), HOYA Corporation (Japan), NuFlare Technology, Inc. (Japan), KLA Corporation (US), ADVANTEST CORPORATION (Japan), SUSS MicroTec SE (Germany), Applied Materials, Inc. (US), Park Systems (South Korea), Imagine Optic (France), MKS Inc. (US), Taiwan Semiconductor Manufacturing Company Limited (TSMC) (Taiwan), Intel Corporation (US), Samsung (South Korea), SK HYNIX INC. (South Korea), and Micron Technology (US). The study includes an in-depth competitive analysis of these key players in the extreme ultraviolet (EUV) lithography market, with their company profiles, recent developments, and key market strategies.

Study Coverage

The report segments the extreme ultraviolet (EUV) lithography market and forecasts its components, system types, end users, applications, and regions. The report also discusses the drivers, restraints, opportunities, and challenges pertaining to the market. It provides a detailed view of the market across three main regions—Americas, Asia Pacific, and EMEA. The report includes a value chain analysis of the key players and their competitive analysis of the EUV lithography ecosystem.

Key Benefits of Buying the Report

• Analysis of key drivers (surging deployment of EUV lithography across leading-edge foundry nodes), restraints (high upfront capital investment), opportunities (increasing investments in advanced EUV lithography and semiconductor devices), and challenges (competition from alternative lithography techniques) influencing the growth of the extreme ultraviolet (EUV) lithography market
• Products/Solution/Service Development/Innovation: Detailed insights into upcoming components, technologies, research, and development activities in the extreme ultraviolet (EUV) lithography market
• Market Development: Comprehensive information about lucrative markets–the report analyzes the extreme ultraviolet (EUV) lithography market across varied regions
• Market Diversification: Exhaustive information about new EUV lithography in untapped geographies, recent developments, and investments in the extreme ultraviolet (EUV) lithography market
• Competitive Assessment: In-depth assessment of market shares and growth strategies, and offerings of leading players offering components of EUV lithography, such as KLA Corporation (US), ZEISS Group (Germany), TRUMPF (Germany), AGC Inc. (Japan), and Lasertec Corporation (Japan)

Table of Contents

1 INTRODUCTION 20
1.1 STUDY OBJECTIVES 20
1.2 MARKET DEFINITION 20
1.3 STUDY SCOPE 21
1.3.1 MARKETS COVERED AND REGIONAL SCOPE 21
1.3.2 INCLUSIONS AND EXCLUSIONS 22
1.3.3 YEARS CONSIDERED 22
1.4 CURRENCY CONSIDERED 23
1.5 UNIT CONSIDERED 23
1.6 LIMITATIONS 23
1.7 STAKEHOLDERS 23
1.8 SUMMARY OF CHANGES 24
2 EXECUTIVE SUMMARY 25
2.1 MARKET HIGHLIGHTS AND KEY INSIGHTS 25
2.2 KEY MARKET PARTICIPANTS: MAPPING OF STRATEGIC DEVELOPMENTS 26
2.3 DISRUPTIVE TRENDS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 27
2.4 HIGH-GROWTH SEGMENTS 28
2.5 REGIONAL SNAPSHOT: MARKET SIZE, GROWTH RATE, AND FORECAST 29
3 PREMIUM INSIGHTS 30
3.1 ATTRACTIVE OPPORTUNITIES FOR PLAYERS IN
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 30
3.2 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER 31
3.3 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION 31
3.4 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION 32
4 MARKET OVERVIEW 33
4.1 INTRODUCTION 33
4.2 MARKET DYNAMICS 33
4.2.1 DRIVERS 34
4.2.1.1 Surging deployment of EUV lithography across leading-edge foundry nodes 34
4.2.1.2 Elevating use of AI accelerators and deep learning processors in HPC systems 34
4.2.1.3 Increasing complexity of integrated circuits 35
4.2.1.4 Rapid advancements in consumer electronics 35
4.2.2 RESTRAINTS 36
4.2.2.1 High upfront capital investment 36
4.2.2.2 Requirement for advanced infrastructure and skilled workforce 37
4.2.3 OPPORTUNITIES 38
4.2.3.1 Increasing investments in advanced EUV lithography and semiconductor devices 38
4.2.3.2 Emerging applications of EUV lithography 38
4.2.3.3 Advancements in memory modules and chips 39
4.2.3.4 Integration of EUV lithography into advanced display manufacturing 39
4.2.3.5 Application of advanced patterning technologies in photonics and optics production 40
4.2.3.6 Commercialization of High-NA EUV lithography 40
4.2.4 CHALLENGES 41
4.2.4.1 Competition from alternative lithography techniques 41
4.2.4.2 Difficulty in sustaining high source power and productivity 42
4.2.4.3 Detecting and addressing mask defects and yield-related challenges 42
5 INDUSTRY TRENDS 44
5.1 INTRODUCTION 44
5.2 PORTER’S FIVE FORCES ANALYSIS 44
5.2.1 INTENSITY OF COMPETITIVE RIVALRY 45
5.2.2 THREAT OF NEW ENTRANTS 45
5.2.3 THREAT OF SUBSTITUTES 45
5.2.4 BARGAINING POWER OF BUYERS 45
5.2.5 BARGAINING POWER OF SUPPLIERS 46
5.3 MACROECONOMIC OUTLOOK 46
5.3.1 INTRODUCTION 46
5.3.2 GDP TRENDS AND FORECAST 46
5.3.3 TRENDS IN FOUNDRIES 48
5.3.4 TRENDS IN INTEGRATED DEVICE MANUFACTURERS (IDMS) 48
5.4 VALUE CHAIN ANALYSIS 48
5.4.1 R&D ENGINEERS 49
5.4.2 RAW MATERIAL PROVIDERS AND COMPONENT MANUFACTURERS 49
5.4.3 SYSTEM INTEGRATORS AND MANUFACTURERS 49
5.4.4 MARKETING & SALES SERVICES PROVIDERS 50
5.4.5 END USERS 50
5.5 ECOSYSTEM ANALYSIS 50
5.6 PRICING ANALYSIS 51
5.6.1 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM TYPES,
BY KEY PLAYER, 2021–2025 52
5.6.2 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2021–2025 53
5.7 TRADE ANALYSIS 53
5.7.1 IMPORT SCENARIO (HS CODE 8442) 54
5.7.2 EXPORT SCENARIO (HS CODE 8442) 55

5.8 KEY CONFERENCES AND EVENTS, 2026–2027 56
5.9 TRENDS/DISRUPTIONS IMPACTING CUSTOMER BUSINESS 57
5.10 INVESTMENT AND FUNDING SCENARIO 58
5.11 CASE STUDY ANALYSIS 58
5.11.1 INTEL SECURES EXCLUSIVE HIGH-NA EUV LITHOGRAPHY MACHINES TO RESHAPE SUPPLY CHAIN 58
5.11.2 TSMC DEPLOYS EUV LITHOGRAPHY SYSTEMS TO BOOST PRODUCTION CAPACITY 58
5.11.3 SAMSUNG ELECTRONICS ADVANCES 3 NM GAA PRODUCTION USING EUV LITHOGRAPHY 59
5.12 IMPACT OF 2025 US TARIFF ON EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 59
5.12.1 INTRODUCTION 59
5.12.2 KEY TARIFF RATES 60
5.12.3 PRICE IMPACT ANALYSIS 61
5.12.4 IMPACT ON COUNTRY/REGION 62
5.12.4.1 US 62
5.12.4.2 Europe 62
5.12.4.3 Asia Pacific 63
5.12.5 IMPACT ON END USERS 63
6 TECHNOLOGICAL ADVANCEMENTS, AI-DRIVEN IMPACT, PATENTS,
AND INNOVATIONS 64
6.1 TECHNOLOGY ANALYSIS 64
6.1.1 KEY EMERGING TECHNOLOGIES 64
6.1.1.1 High-NA EUV lithography technology 64
6.1.1.2 Advanced EUV resist and patterning materials 64
6.1.2 COMPLEMENTARY TECHNOLOGIES 64
6.1.2.1 Mask pellicles 64
6.1.2.2 Plasma generation 65
6.1.3 ADJACENT TECHNOLOGIES 65
6.1.3.1 Extreme ultraviolet reflectometry (EUVR) 65
6.1.3.2 Atomic layer deposition (ALD) 66
6.2 TECHNOLOGY/PRODUCT ROADMAP 66
6.2.1 SHORT-TERM (2025–2027): PRODUCTIVITY OPTIMIZATION & ADVANCED NODE SCALING 66
6.2.2 MID-TERM (2027–2030): HIGH-NA EUV COMMERCIALIZATION & PROCESS MATURITY 67
6.2.3 LONG-TERM (2030–2035+): FULL HIGH-NA DEPLOYMENT & NEXT-GEN LITHOGRAPHY INTEGRATION 68
6.3 PATENT ANALYSIS 69
6.4 IMPACT OF AI ON EUV LITHOGRAPHY 71
6.4.1 TOP USE CASES AND MARKET POTENTIAL 72
6.4.2 BEST PRACTICES IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 72
6.4.3 CASE STUDIES OF AI IMPLEMENTATION IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 73
6.4.4 INTERCONNECTED/ADJACENT ECOSYSTEM AND IMPACT ON MARKET PLAYERS 73
6.4.5 CLIENTS’ READINESS TO ADOPT AI IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 73
7 REGULATORY LANDSCAPE 74
7.1 INTRODUCTION 74
7.2 REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS 74
7.3 REGULATIONS 75
7.4 STANDARDS 76
7.4.1 SEMI STANDARDS 76
7.4.2 ISO & IEC ELECTRICAL, MECHANICAL, AND SAFETY STANDARDS 76
7.4.3 ISO 9001:2015 QUALITY MANAGEMENT SYSTEM STANDARDS 76
7.4.4 ISO 14001 ENVIRONMENTAL MANAGEMENT STANDARDS 76
7.4.5 ROHS & REACH COMPLIANCE STANDARDS 76
7.4.6 CYBERSECURITY & DATA INTEGRITY STANDARDS 76
7.5 GOVERNMENT REGULATIONS 77
7.5.1 US 77
7.5.2 EUROPE 77
7.5.3 CHINA 77
7.5.4 JAPAN 77
7.5.5 INDIA 77
7.6 SUSTAINABILITY IMPACT AND REGULATORY POLICY INITIATIVES 78
7.7 CERTIFICATIONS, LABELING, AND ECO-STANDARDS 78
8 CUSTOMER LANDSCAPE AND BUYER BEHAVIOR 80
8.1 DECISION-MAKING PROCESS 80
8.2 KEY STAKEHOLDERS AND BUYING CRITERIA 82
8.2.1 KEY STAKEHOLDERS IN BUYING PROCESS 82
8.2.2 BUYING CRITERIA 82
8.3 ADOPTION BARRIERS AND INTERNAL CHALLENGES 83
8.4 UNMET NEEDS OF VARIOUS END USERS 84
8.5 MARKET PROFITABILITY 85
9 APPLICATION NODES OF EXTREME ULTRAVIOLET (EUV)
LITHOGRAPHY TECHNOLOGY 86
9.1 INTRODUCTION 86
9.2 7 NM 86
9.3 5 NM 86
9.4 3 NM 87
9.5 2 NM 87
9.6 SUB-2 NM 87
10 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COMPONENT 88
10.1 INTRODUCTION 89
10.2 LIGHT SOURCES 90
10.2.1 RISING FOCUS ON ENHANCING PRECISION AND THROUGHPUT IN SEMICONDUCTORS TO BOOST DEMAND 90
10.3 OPTICS 91
10.3.1 ELEVATING DEMAND FOR HIGHER NUMERICAL APERTURE (HIGH-NA) EUV SYSTEMS TO SUPPORT SEGMENTAL GROWTH 91
10.4 MASKS 91
10.4.1 GREATER EMPHASIS ON PROCESS EFFICIENCY AND SUSTAINABILITY IN EUV MASK PRODUCTION TO CONTRIBUTE TO SEGMENTAL GROWTH 91
10.5 OTHER COMPONENTS 92
11 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE 93
11.1 INTRODUCTION 94
11.2 0.33 NA EUV SYSTEMS (NXE) 96
11.2.1 COST EFFICIENCY AND RELIABILITY TO STIMULATE DEMAND 96
11.3 0.55 NA EUV SYSTEMS (EXE) 96
11.3.1 ABILITY TO IMPROVE YIELD FOR ADVANCED LOGIC, MEMORY, AND AI CHIPS TO DRIVE MARKET 96
12 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER 97
12.1 INTRODUCTION 98
12.2 INTEGRATED DEVICE MANUFACTURERS (IDMS) 99
12.2.1 INNOVATION IN ADVANCED AND ENERGY-EFFICIENT MICROCHIPS TO FOSTER MARKET GROWTH 99
12.3 FOUNDRIES 101
12.3.1 STRONG FOCUS ON HIGH-VOLUME SEMICONDUCTOR MANUFACTURING TO SUPPORT SEGMENTAL GROWTH 101
13 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION 104
13.1 INTRODUCTION 105
13.2 LOGIC CHIPS 106
13.2.1 INCREASING COMPLEXITY AND COSTS OF LOGIC DEVICES TO BOOST DEMAND FOR EUV LITHOGRAPHY 106
13.2.2 CPU 106
13.2.3 GPU 106
13.2.4 AI ACCELERATOR 107
13.2.5 SOC 107
13.2.6 ASIC 107

13.3 MEMORY CHIPS 107
13.3.1 GROWING DEMAND FOR ARTIFICIAL INTELLIGENCE, CLOUD COMPUTING, AND HIGH-PERFORMANCE APPLICATIONS TO CREATE OPPORTUNITIES 107
13.3.2 DRAM 107
13.3.3 HBM 108
14 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION 109
14.1 INTRODUCTION 110
14.2 AMERICAS 111
14.2.1 GROWING DEMAND FOR HIGH-PERFORMANCE, ENERGY-EFFICIENT SEMICONDUCTOR SOLUTIONS TO BOOST MARKET 111
14.3 EMEA 113
14.3.1 EARLY-STAGE COMMERCIALIZATION OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY TO CREATE GROWTH OPPORTUNITIES 113
14.4 ASIA PACIFIC 115
14.4.1 CHINA 117
14.4.1.1 Domestic semiconductor capacity building and technology localization to drive market 117
14.4.2 JAPAN 118
14.4.2.1 Presence of leading technology providers to contribute to market growth 118
14.4.3 SOUTH KOREA 118
14.4.3.1 Strong global position in memory and logic semiconductor manufacturing to foster market growth 118
14.4.4 TAIWAN 119
14.4.4.1 Significant investments in eco-friendly EUV system components to propel market 119
14.4.5 REST OF ASIA PACIFIC 120
15 COMPETITIVE LANDSCAPE 121
15.1 OVERVIEW 121
15.2 KEY PLAYER COMPETITIVE STRATEGIES/RIGHT TO WIN, 2024–2025 121
15.3 REVENUE ANALYSIS, 2021–2025 123
15.4 MARKET SHARE ANALYSIS, 2025 123
15.5 COMPANY VALUATION AND FINANCIAL METRICS 125
15.5.1 COMPANY VALUATION 125
15.5.2 FINANCIAL METRICS 125
15.6 PRODUCT COMPARISON 126
15.7 COMPANY EVALUATION MATRIX: KEY PLAYERS, 2025 127
15.7.1 STARS 127
15.7.2 EMERGING LEADERS 127
15.7.3 PERVASIVE PLAYERS 127
15.7.4 PARTICIPANTS 127
15.7.5 COMPANY FOOTPRINT: KEY PLAYERS, 2025 129
15.7.5.1 Company footprint 129
15.7.5.2 Region footprint 130
15.7.5.3 End user footprint 131
15.7.5.4 Component footprint 132
15.8 COMPANY EVALUATION MATRIX: STARTUPS/SMES, 2025 132
15.8.1 PROGRESSIVE COMPANIES 132
15.8.2 RESPONSIVE COMPANIES 133
15.8.3 DYNAMIC COMPANIES 133
15.8.4 STARTING BLOCKS 133
15.8.5 COMPETITIVE BENCHMARKING: STARTUPS/SMES, 2025 134
15.8.5.1 Detailed list of key startups/SMEs 134
15.8.5.2 Competitive benchmarking of key startups/SMEs 134
15.9 COMPETITIVE SCENARIO 135
15.9.1 PRODUCT LAUNCHES 135
15.9.2 DEALS 137
16 COMPANY PROFILES 138
16.1 INTRODUCTION 138
16.2 KEY SYSTEM MANUFACTURERS 138
16.2.1 ASML 138
16.2.1.1 Business overview 138
16.2.1.2 Products/Solutions/Services offered 140
16.2.1.3 Recent developments 141
16.2.1.3.1 Deals 141
16.2.1.4 MnM view 141
16.2.1.4.1 Key strengths/Right to win 141
16.2.1.4.2 Strategic choices 141
16.2.1.4.3 Weaknesses/Competitive threats 141
16.3 KEY COMPONENT MANUFACTURERS 142
16.3.1 LIGHT SOURCE MANUFACTURERS 142
16.3.1.1 TRUMPF 142
16.3.1.1.1 Business overview 142
16.3.1.1.2 Products/Solutions/Services offered 144
16.3.1.1.3 MnM view 144
16.3.1.1.3.1 Key strengths/Right to win 144
16.3.1.1.3.2 Strategic choices 144
16.3.1.1.3.3 Weaknesses/Competitive threats 144
16.3.1.2 Ushio Inc. 145
16.3.1.2.1 Business overview 145
16.3.1.2.2 Products/Solutions/Services offered 146
16.3.1.2.3 MnM view 147
16.3.1.2.3.1 Key strengths/Right to win 147
16.3.1.2.3.2 Strategic choices 147
16.3.1.2.3.3 Weaknesses/Competitive threats 147
16.3.1.3 Energetiq 148
16.3.1.3.1 Business overview 148
16.3.1.3.2 Products/Solutions/Services offered 148
16.3.1.3.3 Recent developments 149
16.3.1.3.3.1 Product launches 149
16.3.1.3.4 MnM view 149
16.3.1.3.4.1 Key strengths/Right to win 149
16.3.1.3.4.2 Strategic choices 150
16.3.1.3.4.3 Weaknesses/Competitive threats 150
16.3.2 OPTICS MANUFACTURERS 151
16.3.2.1 ZEISS Group 151
16.3.2.1.1 Business overview 151
16.3.2.1.2 Products/Solutions/Services offered 153
16.3.2.1.3 Recent developments 154
16.3.2.1.3.1 Product launches 154
16.3.2.1.3.2 Deals 154
16.3.2.2 NTT ADVANCED TECHNOLOGY CORPORATION 155
16.3.2.2.1 Business overview 155
16.3.2.2.2 Products/Solutions/Services offered 156
16.3.2.3 Rigaku Holdings Corporation 157
16.3.2.3.1 Business overview 157
16.3.2.3.2 Products/Solutions/Services offered 158
16.3.2.4 Edmund Optics Inc. 159
16.3.2.4.1 Business overview 159
16.3.2.4.2 Products/Solutions/Services offered 160
16.3.3 MASK MANUFACTURERS 161
16.3.3.1 AGC Inc. 161
16.3.3.1.1 Business overview 161
16.3.3.1.2 Products/Solutions/Services offered 162
16.3.3.2 Tekscend Photomask 163
16.3.3.2.1 Business overview 163
16.3.3.2.2 Products/Solutions/Services offered 164
16.3.3.3 Lasertec Corporation 165
16.3.3.3.1 Business overview 165
16.3.3.3.2 Products/Solutions/Services offered 167
16.3.3.3.3 Recent developments 169
16.3.3.3.3.1 Product launches 169
16.3.3.4 HOYA Corporation 170
16.3.3.4.1 Business overview 170
16.3.3.4.2 Products/Solutions/Services offered 172
16.3.3.5 NuFlare Technology Inc. 173
16.3.3.5.1 Business overview 173
16.3.3.5.2 Products/Solutions/Services offered 173
16.3.4 OTHER COMPONENT MANUFACTURERS 174
16.3.4.1 KLA Corporation 174
16.3.4.2 ADVANTEST CORPORATION 175
16.3.4.3 SUSS MicroTec SE 176
16.3.4.4 Applied Materials, Inc. 177
16.3.4.5 Park Systems 178
16.3.4.6 Imagine Optic 179
16.3.4.7 MKS Inc. 180
16.4 END USERS 181
16.4.1 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED 181
16.4.2 INTEL CORPORATION 182
16.4.3 SAMSUNG 183
16.4.4 SK HYNIX INC. 184
16.4.5 MICRON TECHNOLOGY, INC. 185
17 RESEARCH METHODOLOGY 186
17.1 RESEARCH DATA 186
17.2 SECONDARY AND PRIMARY RESEARCH 187
17.2.1 SECONDARY DATA 189
17.2.1.1 List of key secondary sources 189
17.2.1.2 Key data from secondary sources 189
17.2.2 PRIMARY DATA 190
17.2.2.1 List of primary interview participants 190
17.2.2.2 Breakdown of primaries 190
17.2.2.3 Key data from primary sources 191
17.2.2.4 Key industry insights 191
17.3 MARKET SIZE ESTIMATION 192
17.3.1 BOTTOM-UP APPROACH 192
17.3.1.1 Approach to arrive at market size using bottom-up analysis
(demand side) 193
17.3.2 TOP-DOWN APPROACH 193
17.3.2.1 Approach to arrive at market size using top-down analysis
(supply side) 193
17.4 MARKET SIZE ESTIMATION FOR BASE YEAR 194
17.5 MARKET FORECAST APPROACH 195
17.5.1 SUPPLY SIDE 195
17.5.2 DEMAND SIDE 195
17.6 DATA TRIANGULATION 196
17.7 RESEARCH ASSUMPTIONS 197
17.8 RESEARCH LIMITATIONS 197
17.9 RISK ANALYSIS 198
18 APPENDIX 199
18.1 INSIGHTS FROM INDUSTRY EXPERTS 199
18.2 DISCUSSION GUIDE 199
18.3 KNOWLEDGESTORE: MARKETSANDMARKETS’ SUBSCRIPTION PORTAL 202
18.4 CUSTOMIZATION OPTIONS 204
18.5 RELATED REPORTS 204
18.6 AUTHOR DETAILS 205

LIST OF TABLES

TABLE 1 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: INCLUSIONS AND EXCLUSIONS 22
TABLE 2 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: SUMMARY OF CHANGES 24
TABLE 3 PORTER’S FIVE FORCES ANALYSIS: EXTREME ULTRAVIOLET (EUV)
LITHOGRAPHY MARKET 45
TABLE 4 GDP PERCENTAGE CHANGE, BY KEY COUNTRY, 2021–2029 46
TABLE 5 ROLE OF COMPANIES IN EUV LITHOGRAPHY ECOSYSTEM 51
TABLE 6 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM TYPES OFFERED BY ASML, 2021–2025 (USD) 52
TABLE 7 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2021–2025 (USD MILLION) 53
TABLE 8 IMPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY,
2020–2024 (USD MILLION) 54
TABLE 9 EXPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY,
2020–2024 (USD MILLION) 55
TABLE 10 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: KEY CONFERENCES AND EVENTS, 2026–2027 56
TABLE 11 US-ADJUSTED RECIPROCAL TARIFF RATES 60
TABLE 12 LIST OF MAJOR PATENTS, 2023–2024 70
TABLE 13 TOP USE CASES AND MARKET POTENTIAL 72
TABLE 14 BEST PRACTICES FOLLOWED BY COMPANIES 72
TABLE 15 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: CASE STUDIES RELATED TO AI IMPLEMENTATION 73
TABLE 16 INTERCONNECTED/ADJACENT ECOSYSTEM AND IMPACT ON MARKET PLAYERS 73
TABLE 17 AMERICAS: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS 74
TABLE 18 EUROPE: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS 75
TABLE 19 ASIA PACIFIC: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS 75
TABLE 20 EUV LITHOGRAPHY: REGULATIONS 75
TABLE 21 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USERS (%) 82
TABLE 22 KEY BUYING CRITERIA FOR END USERS 83
TABLE 23 UNMET NEEDS OF END USERS OF EUV LITHOGRAPHY TECHNOLOGY 85
TABLE 24 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COMPONENT,
2022–2025 (USD MILLION) 89
TABLE 25 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COMPONENT,
2026–2032 (USD MILLION) 90
TABLE 26 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE, IN TERMS OF VALUE AND VOLUME, 2022–2025 94
TABLE 27 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE, IN TERMS OF VALUE AND VOLUME, 2026–2032 94
TABLE 28 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE,
2022–2025 (USD MILLION) 95
TABLE 29 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE,
2026–2032 (USD MILLION) 95
TABLE 30 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER,
2022–2025 (USD MILLION) 98
TABLE 31 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER,
2026–2032 (USD MILLION) 99
TABLE 32 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2022–2025 (USD MILLION) 100
TABLE 33 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2026–2032 (USD MILLION) 100
TABLE 34 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2022–2025 (USD MILLION) 100
TABLE 35 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2026–2032 (USD MILLION) 101
TABLE 36 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2022–2025 (USD MILLION) 102
TABLE 37 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2026–2032 (USD MILLION) 102
TABLE 38 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN
ASIA PACIFIC, BY COUNTRY, 2022–2025 (USD MILLION) 102
TABLE 39 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN
ASIA PACIFIC, BY COUNTRY, 2026–2032 (USD MILLION) 103
TABLE 40 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION,
2022–2025 (USD MILLION) 105
TABLE 41 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION,
2026–2032 (USD MILLION) 105
TABLE 42 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION,
2022–2025 (USD MILLION) 110
TABLE 43 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION,
2026–2032 (USD MILLION) 111
TABLE 44 AMERICAS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022–2025 (USD MILLION) 112
TABLE 45 AMERICAS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026–2032 (USD MILLION) 112
TABLE 46 EMEA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022–2025 (USD MILLION) 114
TABLE 47 EMEA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026–2032 (USD MILLION) 114
TABLE 48 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COUNTRY, 2022–2025 (USD MILLION) 116
TABLE 49 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COUNTRY, 2026–2032 (USD MILLION) 116
TABLE 50 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022–2025 (USD MILLION) 116
TABLE 51 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026–2032 (USD MILLION) 117
TABLE 52 CHINA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022–2025 (USD MILLION) 117
TABLE 53 CHINA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026–2032 (USD MILLION) 117
TABLE 54 JAPAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022–2025 (USD MILLION) 118
TABLE 55 JAPAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026–2032 (USD MILLION) 118
TABLE 56 SOUTH KOREA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET,
BY END USER, 2022–2025 (USD MILLION) 119
TABLE 57 SOUTH KOREA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET,
BY END USER, 2026–2032 (USD MILLION) 119
TABLE 58 TAIWAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022–2025 (USD MILLION) 119
TABLE 59 TAIWAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026–2032 (USD MILLION) 120
TABLE 60 REST OF ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET,
BY END USER, 2022–2025 (USD MILLION) 120
TABLE 61 REST OF ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET,
BY END USER, 2026–2032 (USD MILLION) 120
TABLE 62 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: KEY PLAYER STRATEGIES/ RIGHT TO WIN, 2024–2025 121
TABLE 63 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DEGREE OF COMPETITION 124
TABLE 64 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: REGION FOOTPRINT, 2025 130
TABLE 65 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET:
END USER FOOTPRINT, 2025 131
TABLE 66 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET:
COMPONENT FOOTPRINT, 2025 132
TABLE 67 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET:
LIST OF KEY STARTUPS/SMES, 2025 134
TABLE 68 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPETITIVE BENCHMARKING OF KEY STARTUPS/SMES, 2025 134
TABLE 69 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: PRODUCT LAUNCHES, OCTOBER 2024 TO DECEMBER 2025 135
TABLE 70 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DEALS,
OCTOBER 2024 TO DECEMBER 2025 137
TABLE 71 ASML: COMPANY OVERVIEW 139
TABLE 72 ASML: PRODUCTS/SOLUTIONS/SERVICES OFFERED 140
TABLE 73 ASML: DEALS 141
TABLE 74 TRUMPF: COMPANY OVERVIEW 142
TABLE 75 TRUMPF: PRODUCTS/SOLUTIONS/SERVICES OFFERED 144
TABLE 76 USHIO INC.: COMPANY OVERVIEW 145
TABLE 77 USHIO INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED 146
TABLE 78 ENERGETIQ: COMPANY OVERVIEW 148
TABLE 79 ENERGETIQ: PRODUCTS/SOLUTIONS/SERVICES OFFERED 148
TABLE 80 ENERGETIQ: PRODUCT LAUNCHES 149
TABLE 81 ZEISS GROUP: COMPANY OVERVIEW 151
TABLE 82 ZEISS GROUP: PRODUCTS/SOLUTIONS/SERVICES OFFERED 153
TABLE 83 ZEISS GROUP: PRODUCT LAUNCHES 154
TABLE 84 ZEISS GROUP: DEALS 154
TABLE 85 NTT ADVANCED TECHNOLOGY CORPORATION: COMPANY OVERVIEW 155
TABLE 86 NTT ADVANCED TECHNOLOGY CORPORATION:
PRODUCTS/SOLUTIONS/SERVICES OFFERED 156
TABLE 87 RIGAKU HOLDINGS CORPORATION: COMPANY OVERVIEW 157
TABLE 88 RIGAKU HOLDINGS CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED 158
TABLE 89 EDMUND OPTICS INC.: COMPANY OVERVIEW 159
TABLE 90 EDMUND OPTICS INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED 160
TABLE 91 AGC INC.: COMPANY OVERVIEW 161
TABLE 92 AGC INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED 162
TABLE 93 TEKSCEND PHOTOMASK: COMPANY OVERVIEW 163
TABLE 94 TEKSCEND PHOTOMASK: PRODUCTS/SOLUTIONS/SERVICES OFFERED 164
TABLE 95 LASERTEC CORPORATION: COMPANY OVERVIEW 165
TABLE 96 LASERTEC CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED 167
TABLE 97 LASERTEC CORPORATION: PRODUCT LAUNCHES 169
TABLE 98 HOYA CORPORATION: COMPANY OVERVIEW 170
TABLE 99 HOYA CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED 172
TABLE 100 NUFLARE TECHNOLOGY INC.: COMPANY OVERVIEW 173
TABLE 101 NUFLARE TECHNOLOGY INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED 173
TABLE 102 KLA CORPORATION: COMPANY OVERVIEW 174
TABLE 103 ADVANTEST CORPORATION: COMPANY OVERVIEW 175
TABLE 104 SUSS MICROTEC SE: COMPANY OVERVIEW 176
TABLE 105 APPLIED MATERIALS, INC.: COMPANY OVERVIEW 177
TABLE 106 PARK SYSTEMS: COMPANY OVERVIEW 178
TABLE 107 IMAGINE OPTIC: COMPANY OVERVIEW 179
TABLE 108 MKS INC.: COMPANY OVERVIEW 180
TABLE 109 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED:
COMPANY OVERVIEW 181
TABLE 110 INTEL CORPORATION: COMPANY OVERVIEW 182
TABLE 111 SAMSUNG: COMPANY OVERVIEW 183
TABLE 112 SK HYNIX INC.: COMPANY OVERVIEW 184
TABLE 113 MICRON TECHNOLOGY, INC.: COMPANY OVERVIEW 185
TABLE 114 MAJOR SECONDARY SOURCES 189
TABLE 115 PRIMARY INTERVIEW PARTICIPANTS 190
TABLE 116 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RISK ANALYSIS 198

LIST OF FIGURES

FIGURE 1 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SEGMENTATION AND REGIONAL SCOPE 21
FIGURE 2 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DURATION COVERED 22
FIGURE 3 MARKET SCENARIO 25
FIGURE 4 GLOBAL EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SIZE, 2022–2032 26
FIGURE 5 MAJOR STRATEGIES ADOPTED BY KEY PLAYERS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, 2024–2025 26
FIGURE 6 DISRUPTIVE TRENDS IMPACTING GROWTH OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 27
FIGURE 7 HIGH-GROWTH SEGMENTS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, 2026–2032 28
FIGURE 8 ASIA PACIFIC TO DOMINATE EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2026 29
FIGURE 9 RISING DEMAND FOR ADVANCED SEMICONDUCTOR NOTES TO CREATE OPPORTUNITIES FOR MARKET PLAYERS 30
FIGURE 10 FOUNDRIES TO COMMAND EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2032 31
FIGURE 11 LOGIC CHIPS SEGMENT TO DOMINATE EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2032 31
FIGURE 12 ASIA PACIFIC TO CAPTURE LARGEST SHARE OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2032 32
FIGURE 13 DRIVERS, RESTRAINTS, OPPORTUNITIES, AND CHALLENGES 33
FIGURE 14 IMPACT ANALYSIS: DRIVERS 36
FIGURE 15 IMPACT ANALYSIS: RESTRAINTS 37
FIGURE 16 IMPACT ANALYSIS: OPPORTUNITIES 41
FIGURE 17 IMPACT ANALYSIS: CHALLENGES 43
FIGURE 18 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: PORTER’S
FIVE FORCES ANALYSIS 44
FIGURE 19 EUV LITHOGRAPHY VALUE CHAIN ANALYSIS 49
FIGURE 20 EUV LITHOGRAPHY ECOSYSTEM ANALYSIS 50
FIGURE 21 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM TYPES OFFERED BY KEY PLAYERS, 2021–2025 52
FIGURE 22 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2021–2025 53
FIGURE 23 IMPORT SCENARIO FOR HS CODE 8442-COMPLIANT PRODUCTS IN
TOP 5 COUNTRIES, 2020–2024 54
FIGURE 24 EXPORT SCENARIO FOR HS CODE 8442-COMPLIANT PRODUCTS IN
TOP 5 COUNTRIES, 2020–2024 55
FIGURE 25 TRENDS/DISRUPTIONS IMPACTING CUSTOMER BUSINESS 57
FIGURE 26 INVESTMENT AND FUNDING SCENARIO, 2020–2025 58
FIGURE 27 PATENTS APPLIED AND GRANTED, 2015–2024 69
FIGURE 28 DECISION-MAKING FACTORS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET 81
FIGURE 29 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USERS 82
FIGURE 30 KEY BUYING CRITERIA FOR END USERS 82
FIGURE 31 ADOPTION BARRIERS AND INTERNAL CHALLENGES 84
FIGURE 32 LIGHT SOURCES TO REGISTER HIGHEST CAGR DURING FORECAST PERIOD 89
FIGURE 33 0.55 NA EUV SYSTEMS (EXE) TO EXHIBIT HIGHER CAGR DURING FORECAST PERIOD 95
FIGURE 34 FOUNDRIES TO ACCOUNT FOR LARGER MARKET SHARE IN 2026 98
FIGURE 35 MEMORY CHIPS TO REGISTER HIGHER CAGR DURING FORECAST PERIOD 105
FIGURE 36 ASIA PACIFIC TO DOMINATE EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET THROUGHOUT FORECAST PERIOD 110
FIGURE 37 AMERICAS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SNAPSHOT 112
FIGURE 38 EMEA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SNAPSHOT 114
FIGURE 39 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SNAPSHOT 115
FIGURE 40 REVENUE ANALYSIS OF KEY PLAYERS, 2021–2025 123
FIGURE 41 MARKET SHARE ANALYSIS OF COMPANIES OFFERING EUV LITHOGRAPHY SOLUTIONS, 2025 124
FIGURE 42 COMPANY VALUATION, 2025 125
FIGURE 43 FINANCIAL METRICS, 2025 125
FIGURE 44 PRODUCT COMPARISON 126
FIGURE 45 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPANY EVALUATION MATRIX (KEY PLAYERS), 2025 128
FIGURE 46 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET:
COMPANY FOOTPRINT, 2025 129
FIGURE 47 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET:
COMPANY EVALUATION MATRIX (STARTUPS/SMES), 2025 133
FIGURE 48 ASML: COMPANY SNAPSHOT 139
FIGURE 49 TRUMPF: COMPANY SNAPSHOT 143
FIGURE 50 USHIO INC.: COMPANY SNAPSHOT 146
FIGURE 51 ZEISS GROUP: COMPANY SNAPSHOT 152
FIGURE 52 RIGAKU HOLDINGS CORPORATION: COMPANY SNAPSHOT 158
FIGURE 53 AGC INC.: COMPANY SNAPSHOT 162
FIGURE 54 TEKSCEND PHOTOMASK: COMPANY SNAPSHOT 164
FIGURE 55 LASERTEC CORPORATION: COMPANY SNAPSHOT 166
FIGURE 56 HOYA CORPORATION: COMPANY SNAPSHOT 171
FIGURE 57 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH DESIGN 187
FIGURE 58 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH APPROACH 188
FIGURE 59 DATA CAPTURED FROM SECONDARY SOURCES 189
FIGURE 60 BREAKDOWN OF PRIMARY INTERVIEWS, BY COMPANY TYPE,
DESIGNATION, AND REGION 190
FIGURE 61 DATA CAPTURED FROM PRIMARY SOURCES 191
FIGURE 62 CORE FINDINGS FROM INDUSTRY EXPERTS 191
FIGURE 63 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH FLOW 192
FIGURE 64 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: BOTTOM-UP APPROACH 193
FIGURE 65 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: TOP-DOWN APPROACH 194
FIGURE 66 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SIZE ESTIMATION METHODOLOGY (SUPPLY SIDE) 194
FIGURE 67 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DATA TRIANGULATION 196
FIGURE 68 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH ASSUMPTIONS 197

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