| 出版社 | QYResearch |
| 出版年月 | 2025年10月 |
Photomask Pellicle – Global Market Share and Ranking, Overall Sales and Demand Forecast 2025-2031
フォトマスク用ペリクルの世界市場は、2024年には8億8,400万米ドルに達すると推定され、2025～2031年の予測期間中に7.8%のCAGRで成長し、2031年までに1億4,930万米ドルに再調整された規模になると予測されています。
ペリクルはフォトマスクの一部です。ペリクルはフォトマスク上に設置され、物理的なバリアを形成するためのカバーです。万が一、パーティクルがペリクル上に落ちても、マスク自体には接触しません。ペリクルはマスクの汚染を効果的に防止し、生産効率とチップ品質の向上に重要な役割を果たします。
ペリクルとは、アルミフレームに張られた薄い膜で、フォトマスクに接着され、パーティクルなどの汚染物質から保護します。たとえ膜上にパーティクルが付着したとしても、リソグラフィー工程での露光時に焦点が合っていないため、ウェハやフラットパネルディスプレイには転写されません。 このペリクルの製造プロセスにも、多くの科学的・技術的な要素が絡み合っています。通常、物理蒸着法（PVD）や化学蒸着法（CVD）といった精密な真空コーティング技術を用いて、マスク表面に均一で緻密な膜を形成します。このプロセスでは、膜の品質と性能を確保するために、温度、圧力、ガス流量などのパラメータを精密に制御する必要があります。
本レポートは、フォトマスク用防塵フィルム（ペリクル）の世界市場について、総販売量、売上高、価格、主要企業の市場シェアとランキングに焦点を当て、地域・国別、タイプ別、用途別のフォトマスク用ペリクル分析も含め、包括的な分析を提供することを目的としています。
フォトマスク用防塵フィルム（ペリクル）市場の規模、推定値、および予測は、2024年を基準年として、販売量（千平方メートル）および売上高（百万ドル）の観点から提供され、2020年から2031年までの実績および予測データも含まれています。定量分析と定性分析の両方を用いて、読者が事業戦略や成長戦略を策定し、市場競争状況を評価し、現在の市場における自社のポジションを分析し、フォトマスクペリクルに関する情報に基づいたビジネス上の意思決定を行うのに役立ちます。
Report Overview
The global market for Photomask Pellicle was estimated to be worth US$ 884 million in 2024 and is forecast to a readjusted size of US$ 1493 million by 2031 with a CAGR of 7.8% during the forecast period 2025-2031.
The pellicle is a part of the photomask. As a covering, the pellicle is suspended above the photomask to form a physical barrier. Even if particles fall on it, they will not touch the mask itself. The pellicle can effectively prevent mask contamination and plays a vital role in improving production efficiency and chip quality.
A pellicle is a thin membrane stretched over an aluminum frame and glued to the photomask to protect it from contaminants, such as particles. Even if particles sit on the membrane, they are not printed on the wafer/ flat panel displays because they are out of focus during the exposure from the lithography process.
The process of preparing this Pellicle is also full of scientific and technological content. Usually, precise vacuum coating technology such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) is used to form a uniform and dense film on the surface of the mask. This process requires precise control of parameters such as temperature, pressure and gas flow to ensure the quality and performance of the film.
Global key Photomask Pellicle players cover Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography, Inc., S&S Tech and INKO, etc. In terms of revenue, the global 3 largest companies occupied for a share nearly 85.67% in 2023.
From the perspective of downstream fields, the semiconductor field occupies a dominant position, accounting for about 74.17% in 2023. In semiconductor manufacturing, the role of this Pellicle is far more than simple physical protection. It can also effectively reduce the diffraction effect in the lithography process and improve the imaging quality. Especially in extreme ultraviolet lithography (EUVL) technology, due to the extremely short wavelength of the light source (about 13.5nm), the traditional penetrating mask can no longer be used. At this time, the reflective mask and its Pellicle have become the key technology.
It is worth noting that with the continuous advancement of chip manufacturing technology, the requirements for the mask Pellicle are getting higher and higher. For example, in advanced processes of 7nm and below, the size of the pattern on the mask may be only tens of nanometers, which puts extremely stringent requirements on the uniformity and defect control of the Pellicle.
Globally, Asia (especially China, Taiwan, and South Korea) dominates the mask protective film market. China is playing an increasingly important role in the world. As China develops in the field of semiconductor manufacturing, the demand for mask protective films in the region is also increasing.
This report aims to provide a comprehensive presentation of the global market for Photomask Pellicle, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Photomask Pellicle by region & country, by Type, and by Application.
The Photomask Pellicle market size, estimations, and forecasts are provided in terms of sales volume (K Sqm) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Photomask Pellicle.
Market Segmentation
By Company
- Mitsui Chemicals
- Shin-Etsu
- FINE SEMITECH
- Micro Lithography Inc (MLI)
- S&S Tech
- 印科微(INKO)
- NEPCO
- Canatu
Chapter Outline
Chapter 1: Introduces the report scope of the report, global total market size (value, volume and price). This chapter also provides the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.
Chapter 2: Detailed analysis of Photomask Pellicle manufacturers competitive landscape, price, sales and revenue market share, latest development plan, merger, and acquisition information, etc.
Chapter 3: Provides the analysis of various market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 4: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 5: Sales, revenue of Photomask Pellicle in regional level. It provides a quantitative analysis of the market size and development potential of each region and introduces the market development, future development prospects, market space, and market size of each country in the world.
Chapter 6: Sales, revenue of Photomask Pellicle in country level. It provides sigmate data by Type, and by Application for each country/region.
Chapter 7: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product sales, revenue, price, gross margin, product introduction, recent development, etc.
Chapter 8: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 9: Conclusion.