極端紫外(EUV)リソグラフィー市場 – 2029年までの世界予測

出版社 MarketsandMarkets
出版年月 2024年12月

Extreme Ultraviolet (EUV) Lithography Market – Global Forecast To 2029

極端紫外(EUV)リソグラフィー市場 – コンポーネント (光源、光学部品、マスク、EUV 計測、EUV センサー、EUV サブアセンブリ) およびエンドユーザー (統合デバイス製造業者 (IDM)、ファウンドリ) – 2029年までの世界予測
Extreme Ultraviolet (EUV) Lithography Market by Component (Light Sources, Optics, Masks, EUV Metrology, EUV Sensors, EUV Subassembly) and End User (Integrated Device Manufacturers (IDMs), Foundries) – Global Forecast to 2029

The EUV lithography market is expected to reach USD 22.69 billion by 2029 from USD 12.18 billion in 2024, at a CAGR of 13.2% during the 2024-2029 period.

極端紫外(EUV)リソグラフィー市場は、2024年の121億8000万米ドルから2029年までに226億9000万米ドルに達し、2024年から2029年までのCAGRは13.2%になると予想されています。

極端紫外(EUV)リソグラフィー市場 – 2029年までの世界予測
extreme-ultraviolet-lithography-market-ecosystem

The major players in the EUV lithography market are ASML (Netherlands), Carl Zeiss AG (Germany), NTT Advanced Technology Corporation (Japan), KLA Corporation (US), ADVANTEST CORPORATION (Japan), Ushio Inc. (Japan), SUSS MicroTec SE (Germany), AGC Inc. (Japan), Lasertec Corporation (Japan), TOPPAN Inc. (Japan), Energetiq Technology, Inc. (Japan), NuFlare Technology Inc. (US), Photronics, Inc. (Japan), HOYA Corporation (Japan), TRUMPF (Germany), Rigaku Holdings Corporation (Japan), Edmund Optics Inc. (US), Imagine Optic (France), Applied Materials, Inc. (US), Park Systems (South Koria), EUV Tech (US), Mloptic Crop. (China), MKS Instruments (US), Brooks Automation (US), and Pfeiffer Vacuum GmbH (Germany).

The report provides insights on the following pointers:

  • Analysis of key drivers (adoption of EUV lithography for advanced semiconductor nodes), restraint (significant upfront capital investment in EUV lithography), opportunity (rising investments in advanced EUV lithography and semiconductor devices), and challenges (competition from alternative lithography techniques)
  • Product Development/Innovation: Detailed insights on upcoming technologies, research & development activities, and new product launches in the EUV lithography market
  • Market Development: Comprehensive information about lucrative markets – the report analyses the EUV lithography market across varied regions.
  • Market Diversification: Exhaustive information about new products, untapped geographies, recent developments, and investments in the EUV lithography market
  • Competitive Assessment: In-depth assessment of market shares, growth strategies, and product offerings of leading players like KLA Corporation (US), Carl Zeiss AG (Germany), TRUMPF (Germany), TOPPAN Inc. (Japan), and AGC Inc. (Japan).